JENA, Germany & MAKUHARI, Japan — Carl Zeiss reports the delivery of the first PROVE™ Registration and Overlay Metrology System for photomasks to NuFlare ...

JENA, Germany & MAKUHARI, Japan — Carl Zeiss reports the delivery of the first PROVE™ Registration and Overlay Metrology System for photomasks to NuFlare ...

The jointly developed 'PROVE' overlay metrology system between Carl Zeiss and SEMATECH has successfully passed a key development milestone.

This agreement will provide improved technical and marketing support related to all areas of CMM gear metrology offered by Carl Zeiss. Recognized globally as a market leader for CMM equipment, Carl Zeiss with its partnership with ...

Mask makers and wafer fabs will significantly benefit from the resulting masks with lower registration errors," explains Dr. Oliver Kienzle, Managing Director of Carl Zeiss' Semiconductor Metrology Systems division. The system ...

The AIMS EUV tool is targeted at the 22 nm technology node and beyond.

(Nanowerk News) Carl Zeiss Industrial Metrology celebrated the official grand opening of the West Coast Tech Center (WCTC) in Irvine, California on Tuesday, April 6 and Wednesday, April 7. Set up as a production inspection facility with ...